DocumentCode :
750462
Title :
Layer selective disordering by photoabsorption-induced thermal diffusion in InGaAs/InP based multiquantum well structures
Author :
Marsh, John H. ; De La Rue, Richard M. ; Bryce, A.C. ; Garrett, B. ; Glew, R.W.
Volume :
28
Issue :
12
fYear :
1992
fDate :
6/4/1992 12:00:00 AM
Firstpage :
1117
Lastpage :
1119
Abstract :
Laser-induced intermixing of a buried InGaAs/InGaAsP multiquantum well structure using a CW Nd:YAG laser, operating at a wavelength of 1064 nm, has been demonstrated. The process does not involve transient melting of the semiconductor, but relies on preferential absorption by the active region producing sufficient heat to cause intermixing between the wells and barriers. Photoluminescence measurements at 77 K indicate that bandgap shifts as large as 123 meV are obtainable using moderate laser beam power densities and periods of irradiation.
Keywords :
III-V semiconductors; chemical interdiffusion; gallium arsenide; indium compounds; laser beam effects; luminescence of inorganic solids; photoluminescence; semiconductor quantum wells; thermal diffusion; 1064 nm; 77 K; CW YAG:Nd laser; InGaAs-InGaAsP-InP; YAG:Nd; YAl5O12:Nd; active region; bandgap shifts; buried MQW structure; layer selective disordering; multiquantum well structures; photoabsorption-induced thermal diffusion; photoluminescence measurement; preferential absorption; semiconductor;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19920705
Filename :
141151
Link To Document :
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