Title :
Integrated-Holographic Coarse-Wavelength-Division Multiplexers Patterned by DUV Photolithography
Author :
Greiner, Christoph M. ; Iazikov, Dmitri ; Mossberg, Thomas W.
Author_Institution :
LightSmyth Technol., Inc, Eugene, OR
Abstract :
We demonstrate monolithically integrated four and eight-channel coarse-wavelength-division multiplexers with low insertion loss (IL) and wide flat-top passbands based on integrated-holographic filters. Like thin-film filters (TFFs), integrated-holographic filters function via a multipath interference and thus offer flexible passband control without the IL penalty that passband shaping typically incurs in single-mode angularly dispersive devices. Unlike TFF-based multiplexers, the multiplexers described here are based on the silica-on-silicon planar lightwave circuit platform rather than discrete optics and thus uniquely provide powerful TFF-like filtering function in fully integrated format. The multiplexer performance demonstrated is superior to the integrated solutions demonstrated to date, and competitive with discrete TFF-based devices
Keywords :
holography; integrated optics; integrated optoelectronics; monolithic integrated circuits; multiplexing equipment; optical communication equipment; optical fabrication; optical filters; silicon; silicon compounds; ultraviolet lithography; wavelength division multiplexing; DUV photolithography; SiO2-Si; angularly dispersive devices; coarse-wavelength-division multiplexers; eight-channel multiplexers; flat-top passbands; four-channel multiplexers; fully integrated format; insertion loss; integrated-holographic filters; integrated-holographic multiplexers; monolithic integration; multipath interference; multiplexer performance; passband control; passband shaping; patterning; silica-on-silicon planar lightwave circuit; single-mode devices; thin-film-filter-like filtering function; Dispersion; Insertion loss; Interference; Lithography; Multiplexing; Optical filters; Passband; Shape control; Thin film circuits; Thin film devices;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2006.888163