DocumentCode :
752292
Title :
Generation of multiply-charged metal ions in vacuum arc plasmas
Author :
Oks, Efim M.
Author_Institution :
High Current Electron. Inst., Acad. of Sci., Tomsk, Russia
Volume :
30
Issue :
1
fYear :
2002
fDate :
2/1/2002 12:00:00 AM
Firstpage :
202
Lastpage :
207
Abstract :
The status of experimental research aimed at enhancing the ion charge states in vacuum are plasmas is reviewed. Strong magnetic fields, high-current arc "spikes," and intense electron beams have been used, separately, to increase the metal ion charge states produced. For each method, systematic measurements of ion charge state distributions were made. Each method has its advantages and disadvantages and each method does result in an increase in the mean ion charge state by up to a factor of 2.4, in the work carried out to-date. The last method, use of An added intense electron beam for enhanced ion stripping, is the most effective and work in this direction is being pursued further
Keywords :
ion sources; ionisation; metals; plasma applications; reviews; vacuum arcs; charge state enhancement; high-current arc spikes; intense electron beam; intense electron beams; ion charge state distributions; ion stripping; mean ion charge state; multiple ionization; multiply-charged metal ion generation; strong magnetic fields; vacuum arc ion sources; vacuum arc plasmas; Electron beams; Ion beams; Ion sources; Ionization; Magnetic field measurement; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sources; Vacuum arcs;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2002.1003861
Filename :
1003861
Link To Document :
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