Title :
Fabrication of ultrathin and highly flexible InP-based membranes for microoptoelectromechanical systems at 1.55 μm
Author :
Strassner, M. ; Esnault, J.C. ; Leroy, L. ; Leclercq, J.-L. ; Garrigues, M. ; Sagnes, I.
Author_Institution :
Lab. de Photoniques et de Nanostruct., CNRS, Marcoussis, France
fDate :
4/1/2005 12:00:00 AM
Abstract :
Tunable microcavities have been fabricated to evaluate their tunability in dependence on the membrane thickness. The membrane thickness has been decreased from 615 nm down to a record thickness of 123 nm yielding in a maximum mechanical tunability of 15.15 nm/V2. Furthermore, a three-period /spl lambda//4 InP/air-gap high reflective mirror (R > 99.8% at 1.55 μm) with a record wide stopband of more than 1100 nm has been fabricated. These results are achieved thanks to specific metal-organic vapor-phase epitaxy growth parameters.
Keywords :
Fourier transform spectra; III-V semiconductors; distributed Bragg reflectors; indium compounds; infrared spectra; integrated optics; membranes; micro-optics; microcavities; micromechanical devices; optical fabrication; optical tuning; refractive index; semiconductor epitaxial layers; vapour phase epitaxial growth; 1.55 mum; 123 nm; InP; flexible InP-based membranes; mechanical tunability; metal-organic vapor-phase epitaxy growth parameters; microoptoelectromechanical systems; mirror; stopband; tunable microcavities; ultrathin InP-based membranes; Air gaps; Biomembranes; Epitaxial growth; Fabrication; Indium phosphide; Microcavities; Mirrors; Optical materials; Tunable circuits and devices; Vertical cavity surface emitting lasers; Distributed Bragg reflector (DBR); microactuators; micromachining; microresonators; wavelength-division multiplexing;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2005.844007