Title :
Improvement of fabrication yield and loss uniformity of waveguide mirror
Author :
Park, Jeong-Woo ; Sim, Eun-Deok ; Beak, Yong-Soon
Author_Institution :
Opt. Commun. Devices Dept., Electron. & Telecommun. Res. Inst., Daejeon, South Korea
fDate :
4/1/2005 12:00:00 AM
Abstract :
Using a calculation of overlap integral loss of waveguide mirror was analyzed. According to this analysis method, a taper section was introduced and loss of deep ridge waveguide mirror was improved by 1.1 dB. Analysis shows that the most significant source of loss is the bevel angle of mirror facet. Also, using this method, improvement of fabrication yield and uniformity was obtained. This analysis and design method can be applied to mirrors for integrated photonic circuits and optical printed circuit board.
Keywords :
integrated optics; mirrors; optical design techniques; optical fabrication; optical losses; optical waveguides; ridge waveguides; 1.1 dB; deep ridge waveguide mirror; fabrication yield; integrated photonic circuits; optical printed circuit board; overlap integral loss; Circuits; Etching; Mirrors; Optical device fabrication; Optical devices; Optical fiber communication; Optical losses; Optical waveguide components; Optical waveguides; Turning; Integrated optics; mirrors; optical waveguide components;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2005.843686
