• DocumentCode
    753149
  • Title

    Formation of Coulomb crystals in a capacitively coupled plasma

  • Author

    Vyas, Vivek ; Kushner, Mark J.

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Illinois Univ., Urbana, IL, USA
  • Volume
    30
  • Issue
    1
  • fYear
    2002
  • fDate
    2/1/2002 12:00:00 AM
  • Firstpage
    92
  • Lastpage
    93
  • Abstract
    Dust particle transport in low-temperature plasmas has received considerable attention due to the desire to minimize contamination of wafers during plasma processing of microelectronic devices and as their use to study nonideal plasmas. Observations of dust particles in radio frequency discharges have shown that particles form Coulomb crystals and display collective behavior. Images are presented here of Coulomb crystals simulated in a capacitively coupled discharge. An abrupt splitting of a single hexagonal lattice into two lattices occurs with increasing substrate bias
  • Keywords
    dusty plasmas; high-frequency discharges; plasma applications; plasma diagnostics; plasma transport processes; Coulomb crystals formation; capacitively coupled discharge; capacitively coupled plasma; collective behavior; dust particle transport; lattice splitting; low-temperature plasmas; microelectronic devices; nonideal plasmas; plasma applications; plasma processing; plasma properties; plasma sheaths; radio frequency discharges; single hexagonal lattice; substrate bias; wafer contamination minimisation; Contamination; Crystals; Dusty plasma; Lattices; Microelectronics; Plasma devices; Plasma displays; Plasma materials processing; Plasma simulation; Plasma transport processes;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2002.1003939
  • Filename
    1003939