Title :
Particle-in-cell simulation of a neutral beam source for materials processing
Author :
Hur, Min Sup ; Kim, Sung Jin ; Lee, Ho Seung ; Lee, Jae Koo ; Yeom, Geun-Young
Author_Institution :
Dept. of Electr. Eng., POSTECH, Pohang, South Korea
fDate :
2/1/2002 12:00:00 AM
Abstract :
Neutral beam processing is being considered as a new technique to reduce plasma-induced damage in materials processing. We report on particle-in-cell simulations of a neutral beam source. The system is composed of an ion-beam source and multireflectors which neutralize incident ions and reflect neutral particles. It is revealed from the simulations that about 2.8% of the ion-current from an ion-beam source is successfully neutralized before reaching a diagnostic plate
Keywords :
beam handling techniques; particle sources; plasma materials processing; plasma simulation; diagnostic plate; ion-beam source; ion-current; materials processing; multireflectors; neutral beam source; particle-in-cell simulation; plasma-induced damage; Materials processing; Optical reflection; Particle beams; Plasma applications; Plasma devices; Plasma diagnostics; Plasma materials processing; Plasma simulation; Plasma sources; Silicon;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2002.1003948
