Analysis and design of integrated optical mirrors in planar waveguide technology

Author

Wiechmann, Stefan ; Heider, H.J. ; Müller, Jörg

Author_Institution

Dept. of Micro Syst. Technol., Tech. Univ. of Hamburg-Harburg, Hamburg, Germany

Volume

21

Issue

6

fYear

2003

fDate

6/1/2003 12:00:00 AM

Firstpage

1584

Lastpage

1591

Abstract

We demonstrate integrated optical mirrors in alumina-based waveguides on oxidized silicon substrates. The finite-element method (FEM) is employed for the design of mirrors operating between 1.31 and 1.55 μm at both fundamental polarizations. Excellent agreement between measurement and simulation is achieved for the dispersion behavior of the device. The highly polarization-dependent scattering loss at the reflecting interface is well predicted considering approximate values for the reactive ion etching (RIE) process induced surface roughness.

Keywords

finite element analysis; light scattering; mirrors; optical design techniques; optical losses; optical planar waveguides; optical waveguide theory; sputter etching; substrates; 1.31 to 1.55 micron; alumina-based waveguides; dispersion behavior; finite-element method; fundamental polarizations; highly polarization-dependent scattering loss; induced surface roughness; integrated optical mirrors; mirrors; optical planar waveguide technology; oxidized silicon substrates; reactive ion etching process; reflecting; Finite element methods; Integrated optics; Mirrors; Optical design; Optical planar waveguides; Optical polarization; Optical scattering; Optical waveguides; Planar waveguides; Silicon;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/JLT.2003.812463

Filename

1216200