Title :
Measurement of the effect of self-heating in strained-silicon MOSFETs
Author :
Jenkins, K.A. ; Rim, K.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
fDate :
6/1/2002 12:00:00 AM
Abstract :
The self-heating of strained-silicon MOSFETs is demonstrated experimentally. Output characteristics measured by a pulse technique, in which self-heating is absent, show as much as 15% greater drain current (for 15% Ge content) than the corresponding static measurements. Comparison of the current measured this way with the static measurements allows an estimate of the channel temperature during the static operation. The temperature rise is compared to a simple estimate of the thermal resistance of the FET.
Keywords :
Ge-Si alloys; MOSFET; heating; silicon-on-insulator; thermal resistance; SOI; Si-SiGe; current-voltage curves; lattice mismatch; output characteristics; pulsed I-V method; self-heating effect; strained-silicon MOSFET; temperature rise; thermal healing length; Current measurement; Electrical resistance measurement; FETs; Germanium silicon alloys; MOSFETs; Pulse measurements; Silicon germanium; Temperature; Thermal resistance; Voltage;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2002.1004235