DocumentCode :
754262
Title :
Measurement of the effect of self-heating in strained-silicon MOSFETs
Author :
Jenkins, K.A. ; Rim, K.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
23
Issue :
6
fYear :
2002
fDate :
6/1/2002 12:00:00 AM
Firstpage :
360
Lastpage :
362
Abstract :
The self-heating of strained-silicon MOSFETs is demonstrated experimentally. Output characteristics measured by a pulse technique, in which self-heating is absent, show as much as 15% greater drain current (for 15% Ge content) than the corresponding static measurements. Comparison of the current measured this way with the static measurements allows an estimate of the channel temperature during the static operation. The temperature rise is compared to a simple estimate of the thermal resistance of the FET.
Keywords :
Ge-Si alloys; MOSFET; heating; silicon-on-insulator; thermal resistance; SOI; Si-SiGe; current-voltage curves; lattice mismatch; output characteristics; pulsed I-V method; self-heating effect; strained-silicon MOSFET; temperature rise; thermal healing length; Current measurement; Electrical resistance measurement; FETs; Germanium silicon alloys; MOSFETs; Pulse measurements; Silicon germanium; Temperature; Thermal resistance; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2002.1004235
Filename :
1004235
Link To Document :
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