Title :
Sub-half-micrometer width 2-D MESFET
Author :
Peatman, W.C.B. ; Tsai, R. ; Ytterdal, T. ; Hurt, M. ; Park, H. ; Gonzales, J. ; Shur, M.
Author_Institution :
Dept. of Electr. Eng., Virginia Univ., Charlottesville, VA, USA
Abstract :
Two-dimensional (2-D) MESFET´s having sub-half-micron channel widths have been fabricated on double-/spl delta/-doped Al/sub 0.24/Ga/sub 0.76/As/In/sub 0.18/Ga/sub 0.82/As/GaAs heterostructures. The 2-D MESFET operates like a normal transistor at room temperature but uses very few electrons in the channel (about 500 at peak current and 5 at threshold). Also, the Narrow Channel Effect (NCE) and Drain-Induced Barrier Lowering (DIBL) (two effects which limit the minimum power operation in conventional devices) have been practically eliminated. The 0.4 micron wide device had an ON/OFF current ratio of 10/sup 5/, a peak transconductance of 100 mS/mm, a threshold voltage of 0.3 V, a saturation voltage of 0.2 V, and a subthreshold ideality factor of 1.1. The 2-D MESFET DCFL inverter had a switching voltage and noise margin of 0.35 V and 0.26 V, respectively, at 0.8 V supply. These room temperature results suggest that the 2-D MESFET is an excellent candidate for future low power digital electronics applications.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; aluminium compounds; gallium arsenide; indium compounds; 0.4 micron; 0.8 V; Al/sub 0.24/Ga/sub 0.76/As-In/sub 0.18/Ga/sub 0.82/As-GaAs; DCFL inverter; double-/spl delta/-doped heterostructure; drain-induced barrier lowering; low power digital electronics; narrow channel effect; noise; on/off current ratio; saturation voltage; sub-half-micron channel width; subthreshold ideality factor; switching voltage; threshold voltage; transconductance; transistor; two-dimensional MESFET; CMOS technology; Electron beams; Energy consumption; Fabrication; Gallium arsenide; Gold; MESFETs; Silicon on insulator technology; Temperature; Threshold voltage;
Journal_Title :
Electron Device Letters, IEEE