DocumentCode
75491
Title
New Developments of Near-UV SiPMs at FBK
Author
Pro, T. ; Ferri, Alessandro ; Gola, Alberto ; Serra, N. ; Tarolli, Alessandro ; Zorzi, Nicola ; Piemonte, C.
Author_Institution
Fondazione Bruno Kessler, Trento, Italy
Volume
60
Issue
3
fYear
2013
fDate
Jun-13
Firstpage
2247
Lastpage
2253
Abstract
A thorough characterization of a novel silicon photomultiplier technology for near-ultraviolet (near-UV) light detection, called NUV-SiPM, is presented. It features a peak detection efficiency of more than 30% in the region between 380 and 400 nm, mainly limited by the fill factor. An accurate electric field engineering allows to have excellent noise properties, with a dark count rate of less than 200 kHz/mm2 at maximum efficiency and 20°C. In addition, a breakdown voltage uniformity better than 100 mV at the wafer level and a temperature dependence of 25 mV/°C were obtained. We coupled a 4 × 4 mm2 device to a 3 × 3 × 5 mm3 LYSO scintillator obtaining an energy resolution of 10% FWHM with 511-keV gamma ray irradiation and a coincidence resolving time between two identical detectors of 210-ps FWHM. A detailed description of these results is presented in the paper.
Keywords
coincidence techniques; gamma-ray effects; photomultipliers; silicon radiation detectors; solid scintillation detectors; ultraviolet detectors; FBK; FWHM; LYSO scintillator; coincidence resolving time; dark count rate; electric field engineering; electron volt energy 511 keV; energy resolution; fill factor; gamma ray irradiation; near-UV SiPM; near-ultraviolet light detection; noise properties; peak detection efficiency; silicon photomultiplier technology; temperature dependence; Current measurement; Histograms; Layout; Noise; Photonics; Temperature measurement; Voltage control; Low-level light detection; near ultraviolet light detection; silicon photomultipliers;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2013.2259505
Filename
6519337
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