DocumentCode :
755849
Title :
ESD failure modes: characteristics mechanisms, and process influences
Author :
Amerasekera, Ajith ; Van den Abeelen, Werner ; Van Roozendaal, Leo ; Hannemann, Marcel ; Schofield, Paul
Author_Institution :
Philips Res. Lab., Eindhoven, Netherlands
Volume :
39
Issue :
2
fYear :
1992
fDate :
2/1/1992 12:00:00 AM
Firstpage :
430
Lastpage :
436
Abstract :
Electrostatic discharge (ESD) failure modes in advanced CMOS processes have been electrically and physically characterized, and an analysis has been made of the mechanisms of each of the main failure modes. The physical failure modes have been related to the electrical degradation and, therefore, the electrical signatures of the damage mechanisms have been obtained. The distribution of the electrical characteristics after ESD stress, for a given process or design variation, can then be used to identify freak failures and process defects. Investigations of the influence of processing steps such as silicides, lightly doped drains (LDDs), thin gate oxides, bird´s-beak suppression, and barrier metallization on the electrical damage characteristics and the failure modes are presented and analyzed
Keywords :
CMOS integrated circuits; electrostatic discharge; failure analysis; integrated circuit technology; CMOS processes; ESD; barrier metallization; bird´s-beak suppression; characteristics; damage mechanisms; electrical degradation; electrical signatures; electrostatic discharge; failure mechanisms; failure modes; freak failures; lightly doped drains; process defects; process influences; silicides; thin gate oxides; CMOS process; Degradation; Electric variables; Electrostatic analysis; Electrostatic discharge; Failure analysis; Metallization; Process design; Silicides; Stress;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.121703
Filename :
121703
Link To Document :
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