DocumentCode
756005
Title
A novel in-line automated metrology for photolithography
Author
Leang, Sovarong ; Spanos, Costas J.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
Volume
9
Issue
1
fYear
1996
fDate
2/1/1996 12:00:00 AM
Firstpage
101
Lastpage
107
Abstract
Novel metrology has been developed for measuring in situ film thickness and absorption coefficient simultaneously. Designed specifically for photolithography processes, this metrology if applied to photoresist films, can measure thickness and photoactive compound concentration in situ, which are important parameters for photolithography process control and diagnosis
Keywords
absorption coefficients; optical variables measurement; photolithography; photoresists; thickness measurement; absorption coefficient; in situ measurements; in-line automated metrology; photoactive compound concentration; photolithography; photoresist films; process control; process diagnosis; thickness; Absorption; Condition monitoring; Lithography; Metrology; Optical films; Process control; Reflectivity; Resists; Semiconductor device modeling; Thickness measurement;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.484289
Filename
484289
Link To Document