• DocumentCode
    756184
  • Title

    Ballistic transport in high electron mobility transistors

  • Author

    Wang, Jing ; Lundstrom, Mark

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
  • Volume
    50
  • Issue
    7
  • fYear
    2003
  • fDate
    7/1/2003 12:00:00 AM
  • Firstpage
    1604
  • Lastpage
    1609
  • Abstract
    A general ballistic FET model that was previously used for ballistic MOSFETs is applied to ballistic high electron mobility transistors (HEMTs), and the results are compared with experimental data for a sub-50 nm InAlAs-InGaAs HEMT. The results show that nanoscale HEMTs can be modeled as an intrinsic ballistic transistor with extrinsic source/drain series resistances. We also examine the "ballistic mobility" concept, a technique proposed for extending the drift-diffusion model to the quasi-ballistic regime. Comparison with a rigorous ballistic model shows that under low drain bias the ballistic mobility concept, although nonphysical, can be used to understand the experimental phenomena related to quasi-ballistic transport, such as the degradation of the apparent carrier mobility in short channel devices. We also point out that the ballistic mobility concept loses validity under high drain bias. The conclusions of this paper should be also applicable to other nanoscale transistors with high carrier mobility, such as carbon nanotube FETs and strained silicon MOSFETs.
  • Keywords
    III-V semiconductors; aluminium compounds; ballistic transport; carrier mobility; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; 50 nm; FET model; InAlAs-InGaAs; InAlAs-InGaAs HEMT; ballistic mobility; ballistic transport; carrier mobility; drift-diffusion model; high electron mobility transistor; nanoscale transistor; quasi-ballistic transport; short channel device; Ballistic transport; Electron mobility; FETs; HEMTs; MODFETs; MOSFETs; Quantum capacitance; Silicon; Temperature; Transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2003.814980
  • Filename
    1217243