DocumentCode :
756292
Title :
"Linear kink effect" induced by electron valence band tunneling in ultrathin gate oxide bulk and SOI MOSFETS
Author :
Mercha, A. ; Rafí, J.M. ; Simoen, E. ; Augendre, E. ; Claeys, C.
Author_Institution :
IMEC, Leuven, Belgium
Volume :
50
Issue :
7
fYear :
2003
fDate :
7/1/2003 12:00:00 AM
Firstpage :
1675
Lastpage :
1682
Abstract :
In this paper, evidence will be provided for the existence of a new class of floating body effects, occurring in SOI and bulk MOSFETs in the linear operation regime and called here the linear kink effects (LKEs). It will be shown that for a sufficiently large front-gate voltage VG, the transconductance gm exhibits a second peak, both for n- and p-channel devices. The effect is most pronounced for partially depleted (PD) n-MOSFETs or bulk MOSFETs at cryogenic temperatures. It occurs as well in fully depleted (FD) transistors, with the back-gate preferably biased into accumulation. Associated with the LKE in the drain current, there is a strong increase of the low-frequency noise spectral density SI. Similar as for the impact-ionization related noise overshoot, it is observed that the nature of the spectrum changes from 1/f-like to Lorentzian in the LKE region. It is finally shown that the switching off transients change their sign from negative to positive for VG on above the LKE threshold, giving evidence for the presence of majority carriers in the film during the ON phase.
Keywords :
1/f noise; MOSFET; impact ionisation; semiconductor device noise; silicon-on-insulator; tunnelling; 1/f noise spectrum; Lorentzian noise spectrum; SOI MOSFET; bulk MOSFET; electron valence band tunneling; floating body effect; fully-depleted transistor; impact ionization; linear kink effect; low-frequency noise spectral density; noise overshoot; partially-depleted transistor; switching-off transient; transconductance; ultrathin gate oxide; Cryogenics; Electrons; Low-frequency noise; MOSFET circuits; Noise generators; Switches; Temperature; Threshold voltage; Transconductance; Tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.814983
Filename :
1217253
Link To Document :
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