DocumentCode
756392
Title
Comment on "Annealing behavior of a proton irradiated Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistors grown by MBE"
Author
Fan, Long ; Hao, Yue
Author_Institution
Microelectron. Inst., Xidian Univ., Shaanxi, China
Volume
50
Issue
7
fYear
2003
fDate
7/1/2003 12:00:00 AM
Firstpage
1715
Lastpage
1716
Abstract
For original paper see S.J.Cai et al., ibid., vol.47, p.304-307 (2000). The paper by Cai et al. is the first article referring to radiation effects of Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistors published in this journal. In the paper, authors made use of the shifts of the decomposed three GaN Raman phonon modes E2 to analyze and explain the irradiation effects on GaN. However, we feel that incorrect assignment has been made to the decomposed E2 peaks in GaN and there are obvious errors in citing literature regarding Raman scattering shift rules that warrant comments.
Keywords
III-V semiconductors; Raman spectra; aluminium compounds; annealing; gallium compounds; high electron mobility transistors; molecular beam epitaxial growth; phonons; proton effects; Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistor; AlGaN-GaN; E2 phonon mode; MBE growth; Raman scattering; annealing; proton irradiation; Aluminum compounds; Annealing; Epitaxial growth; Gallium compounds; MODFETs; Phonons; Proton radiation effects; Raman scattering;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2003.814976
Filename
1217262
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