• DocumentCode
    756392
  • Title

    Comment on "Annealing behavior of a proton irradiated Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistors grown by MBE"

  • Author

    Fan, Long ; Hao, Yue

  • Author_Institution
    Microelectron. Inst., Xidian Univ., Shaanxi, China
  • Volume
    50
  • Issue
    7
  • fYear
    2003
  • fDate
    7/1/2003 12:00:00 AM
  • Firstpage
    1715
  • Lastpage
    1716
  • Abstract
    For original paper see S.J.Cai et al., ibid., vol.47, p.304-307 (2000). The paper by Cai et al. is the first article referring to radiation effects of Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistors published in this journal. In the paper, authors made use of the shifts of the decomposed three GaN Raman phonon modes E2 to analyze and explain the irradiation effects on GaN. However, we feel that incorrect assignment has been made to the decomposed E2 peaks in GaN and there are obvious errors in citing literature regarding Raman scattering shift rules that warrant comments.
  • Keywords
    III-V semiconductors; Raman spectra; aluminium compounds; annealing; gallium compounds; high electron mobility transistors; molecular beam epitaxial growth; phonons; proton effects; Al/sub x/Ga/sub 1-x/N/GaN high electron mobility transistor; AlGaN-GaN; E2 phonon mode; MBE growth; Raman scattering; annealing; proton irradiation; Aluminum compounds; Annealing; Epitaxial growth; Gallium compounds; MODFETs; Phonons; Proton radiation effects; Raman scattering;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2003.814976
  • Filename
    1217262