DocumentCode
758637
Title
Threshold voltage and subthreshold slope of multiple-gate SOI MOSFETs
Author
Colinge, J.P. ; Park, J.W. ; Xiong, W.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of California, Davis, CA, USA
Volume
24
Issue
8
fYear
2003
Firstpage
515
Lastpage
517
Abstract
The subthreshold swing and threshold voltage characteristics of multiple-gate SOI transistors have been numerically simulated. These devices behave like cylindrical, surrounding gate devices, with the exception of the corner inversion effect. The corner inversion effect is, however, shown to be negligible if the devices are fully depleted devices or if the gate insulator thickness is small enough.
Keywords
MOSFET; inversion layers; silicon-on-insulator; corner inversion effect; fully depleted devices; gate insulator thickness; multiple-gate SOI MOSFETs; subthreshold slope; threshold voltage; Doping; FETs; Insulation; MOS devices; MOSFETs; Numerical simulation; Semiconductor device modeling; Semiconductor films; Silicon on insulator technology; Threshold voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2003.815153
Filename
1218659
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