• DocumentCode
    758787
  • Title

    Analytical solutions to the one-dimensional oxide-silicon-oxide system

  • Author

    Shi, Xuejie ; Wong, Man

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., China
  • Volume
    50
  • Issue
    8
  • fYear
    2003
  • Firstpage
    1793
  • Lastpage
    1800
  • Abstract
    Analytical solutions to the one-dimensional (1-D) double-side gated oxide-silicon-oxide (OSO) system are derived. The solution space, parameterized by the gate bias conditions, is divided into two separate regions, admitting either a "zero-field" or a "zero-potential" solution. The boundary between the two regions is defined by the "zero-potential and zero-field" solution. Some general implications of the solutions are discussed. The "saturation" values of the body potential for the "zero-field" solution and the body electric field for the "zero-potential" solution are derived. The formalism is also applied to determine a single-gate silicon-on-insulator equivalence of a double-gate metal-oxide-semiconductor capacitor.
  • Keywords
    electric potential; elemental semiconductors; semiconductor-insulator boundaries; silicon; work function; body electric field; double-side gated system; gate bias conditions; one-dimensional oxide-silicon-oxide system; single-gate silicon-on-insulator equivalence; zero-field; zero-potential; Contacts; Electric potential; Electrodes; Energy states; Equations; Helium; Insulation; MOS capacitors; Metal-insulator structures; Silicon on insulator technology;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2003.815138
  • Filename
    1218673