DocumentCode :
759551
Title :
6-in diameter InP single crystals grown by the hot-wall LEC method and the mirror wafers
Author :
Iwasaki, Koji ; Sato, Kouji ; Aoyama, Koichiro ; Numao, Shinji ; Honma, Itsuro ; Sugano, Susumu ; Hoshina, Takaharu ; Sato, Takayuki
Author_Institution :
Electron. Mater. Div., Showa Denko K.K., Saitama, Japan
Volume :
16
Issue :
3
fYear :
2003
Firstpage :
360
Lastpage :
364
Abstract :
6-in diameter Fe-doped semi-insulating InP single crystals have been grown by the hot-wall liquid encapsulated Czochralski method. This method has a quartz inner vessel to stabilize the thermal convection. Temperature gradient and solid-liquid interface shape can be controlled by a multizone heater system. The weight of grown crystal was 18 kg and the full length was 250 mm. The dislocation density was about 1×105 cm-2. The resistivity was more than 1×107 Ωcm and its uniformity was the same as the smaller diameter crystal. The conditions of wafer processing were optimized to improve the wafer flatness. The rolloff and the slope of the wafer surface could be reduced especially by the improvement of the polishing conditions. The typical total thickness variation was 3.3 μm, and it was comparable to the GaAs wafer.
Keywords :
III-V semiconductors; crystal growth from melt; dislocation density; indium compounds; iron; polishing; semiconductor device manufacture; semiconductor growth; 1×107 ohmcm; 18 kg; 250 mm; 6 in; Fe-doped semi-insulating InP; InP single crystals; InP:Fe; crystal growth; dislocation density; etch pit density; hot-wall LEC method; liquid encapsulated Czochralski method; local thickness variation; mirror wafers; multizone heater system; quartz inner vessel; solid-liquid interface shape control; temperature gradient control; thermal convection stabilization; total thickness variation; wafer flatness; wafer processing conditions; wafer surface polishing conditions; Conductivity; Crystals; Electromagnetic heating; Furnaces; Gallium arsenide; Indium phosphide; Microwave devices; Mirrors; Shape control; Thermal stresses;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2003.815626
Filename :
1219479
Link To Document :
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