DocumentCode :
759579
Title :
GaAs pHEMT-based technology for microwave applications in a volume MMIC production environment on 150-mm wafers
Author :
O´Keefe, Matthew F. ; Atherton, John S. ; Bösch, Wolfgang ; Burgess, Paul ; Cameron, Nigel I. ; Snowden, Christopher M.
Author_Institution :
Filtronic Compound Semicond. Ltd., Durham, UK
Volume :
16
Issue :
3
fYear :
2003
Firstpage :
376
Lastpage :
383
Abstract :
The establishment of a 150-mm (6-in) gallium arsenide (GaAs) facility is described together with the development of very high yielding and cost-effective semiconductor device technologies and a manufacturing capacity of over 40000 wafers/annum. The background to the demand for very high volumes of RF products for this market is discussed, together with the prospects for future growth. The paper describes recent process development by the utilization of a data-driven yield management system to support the delivery of high-quality RF products to customers. Finally, "end of line" DC and RF testing of finished 150-mm GaAs pHEMT foundry wafers is described, enabling scalar measurements of power, noise, and intermodulation products as well as vector measurements of S-parameters and noise parameters at frequencies of up to 40 GHz.
Keywords :
HEMT integrated circuits; III-V semiconductors; S-parameters; field effect MMIC; gallium arsenide; integrated circuit manufacture; integrated circuit testing; integrated circuit yield; microwave measurement; production testing; 150 mm; DC testing; GaAs; GaAs PHEMT-based technology; RF products; RF testing; S-parameters measurement; data-driven yield management system; high-volume GaAs facility; high-volume MMIC production environment; intermodulation products; manufacturing capacity; microwave applications; noise measurements; power measurements; scalar measurements; vector measurements; very high yielding technologies; Frequency measurement; Gallium arsenide; MMICs; Microwave devices; Microwave technology; Noise measurement; Power measurement; Production; Radio frequency; Semiconductor device noise;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2003.815631
Filename :
1219482
Link To Document :
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