DocumentCode :
759670
Title :
Sustainable treatment of HF wastewaters from semiconductor industry with a fluidized bed reactor
Author :
Van den Broeck, Kristel ; Van Hoornick, Nausikaä ; Van Hoeymissen, Jan ; de Boer, Robert ; Giesen, Andreas ; Wilms, Dirk
Author_Institution :
Silicon Process & Device Technol. Div., IMEC, Leuven, Belgium
Volume :
16
Issue :
3
fYear :
2003
Firstpage :
423
Lastpage :
428
Abstract :
Within the semiconductor industry, large volumes of hydrogen fluoride (HF) containing wastewaters need to be treated. This paper describes a technique that makes it possible to treat HF wastewater with virtually no waste production. A method based on crystallization of CaF2 on sand particles in a fluidized bed reactor, with trade name Crystalactor, was assessed for the first time with real wastewater originating from a semiconductor prototyping line. Several process parameters were investigated such as influent fluoride concentration, calcium reagent excess, pH, single versus multiple calcium reagent dosing, etc. It can be concluded that the performance of the reactor is greatly dependent on the initial concentrations of calcium and fluoride at the bottom of the reactor (referred to as local saturation). The original hardware design was changed from a single reagent dosing to a multiple reagent dosing to prevent too high local supersaturation values of fluoride and calcium and thus obtain higher CaF2 crystallization efficiencies. Fluoride loads up to 7 kg/m2·h were still possible with multiple reagent dosing, compared to a maximum treatable load of 3.5 kg/m2·h for single reagent dose. Additionally, an alternative post-treatment process based on replacement of calcite by fluorite in a granular calcite column is demonstrated.
Keywords :
calcium compounds; crystallisation; fluidised beds; integrated circuit manufacture; semiconductor device manufacture; waste disposal; water treatment; CaF2; CaF2 crystallization; Crystalactor; H2O; HF; HF wastewater treatment; HF-H2O; calcite replacement; calcium reagent excess; fluidized bed reactor; fluorite; granular calcite column; influent fluoride concentration; local saturation; multiple calcium reagent dosing; pH; post-treatment process; process parameters; sand particles; semiconductor industry; semiconductor prototyping line; single calcium reagent dosing; Calcium; Crystallization; Electronics industry; Fluidization; Hafnium; Hydrogen; Inductors; Production; Prototypes; Wastewater treatment;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2003.815624
Filename :
1219489
Link To Document :
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