Optimization of an injection-controlled excimer laser guided by analytical modeling

The application of an analytical model describing the injection control of pulsed laser systems is successfully demonstrated for the design of a scaled XeF(C→A) excimer laser system. Enhancements to an earlier version o the model which improve the treatment of spatial beam overlap and saturation, unpumped volume, intracavity losses, and a noninteger number of roundtrips in the unstable resonator are described. These result in the accurate simulation of injection-controlled laser performance over a wide range of unstable resonator magnifications, mirror spacings, and intracavity optical losses. Excellent agreement between calculated and experimentally observed energies and temporal profiles of the injection-controlled laser output was obtained