DocumentCode
761621
Title
Statistical bin limits-an approach to wafer disposition in IC fabrication
Author
Illyes, Steve ; Baglee, David A G
Author_Institution
Intel Corp., Rio Rancho, NM, USA
Volume
5
Issue
1
fYear
1992
fDate
2/1/1992 12:00:00 AM
Firstpage
59
Lastpage
61
Abstract
The authors describe the methodology of selecting and implementing statistical bin limits at wafer level test so as to minimize the value added to a defective product, improve the overall outgoing quality and reliability of a product, and provide a tool for helping to drive root cause identification of fabrication problems
Keywords
CMOS integrated circuits; VLSI; circuit reliability; integrated circuit manufacture; integrated circuit testing; statistical analysis; CMOS processes; IC fabrication; VLSI; defective product; quality improvement; reliability; statistical bin limits; wafer disposition; wafer level test; Automation; Etching; Fabrication; Integrated circuit reliability; Medical services; Merging; Plasma applications; Process control; Production; Strips;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.121980
Filename
121980
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