• DocumentCode
    761621
  • Title

    Statistical bin limits-an approach to wafer disposition in IC fabrication

  • Author

    Illyes, Steve ; Baglee, David A G

  • Author_Institution
    Intel Corp., Rio Rancho, NM, USA
  • Volume
    5
  • Issue
    1
  • fYear
    1992
  • fDate
    2/1/1992 12:00:00 AM
  • Firstpage
    59
  • Lastpage
    61
  • Abstract
    The authors describe the methodology of selecting and implementing statistical bin limits at wafer level test so as to minimize the value added to a defective product, improve the overall outgoing quality and reliability of a product, and provide a tool for helping to drive root cause identification of fabrication problems
  • Keywords
    CMOS integrated circuits; VLSI; circuit reliability; integrated circuit manufacture; integrated circuit testing; statistical analysis; CMOS processes; IC fabrication; VLSI; defective product; quality improvement; reliability; statistical bin limits; wafer disposition; wafer level test; Automation; Etching; Fabrication; Integrated circuit reliability; Medical services; Merging; Plasma applications; Process control; Production; Strips;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.121980
  • Filename
    121980