• DocumentCode
    762790
  • Title

    Substrate Bias Voltage Effect on Co-Cr Sputtered Films

  • Author

    Yamashita, N. ; Ohkoshi, M. ; Honda, S. ; Kusuda, T.

  • Author_Institution
    Hiroshima Univ., Faculty of Engng., Higashi-Hiroshima.
  • Volume
    1
  • Issue
    1
  • fYear
    1985
  • fDate
    4/1/1985 12:00:00 AM
  • Firstpage
    5
  • Lastpage
    6
  • Keywords
    Anisotropic magnetoresistance; Argon; Chromium; Coercive force; Crystalline materials; Magnetic films; Magnetic materials; Substrates; Voltage; X-ray diffraction;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1985.4548426
  • Filename
    4548426