DocumentCode :
762790
Title :
Substrate Bias Voltage Effect on Co-Cr Sputtered Films
Author :
Yamashita, N. ; Ohkoshi, M. ; Honda, S. ; Kusuda, T.
Author_Institution :
Hiroshima Univ., Faculty of Engng., Higashi-Hiroshima.
Volume :
1
Issue :
1
fYear :
1985
fDate :
4/1/1985 12:00:00 AM
Firstpage :
5
Lastpage :
6
Keywords :
Anisotropic magnetoresistance; Argon; Chromium; Coercive force; Crystalline materials; Magnetic films; Magnetic materials; Substrates; Voltage; X-ray diffraction;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1985.4548426
Filename :
4548426
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=762790
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