• DocumentCode
    764260
  • Title

    Stochastic electron heating in a capacitive RF discharge with non-Maxwellian and time-varying distributions

  • Author

    Wood, Blake P. ; Lieberman, Michael A. ; Lichtenberg, Allan J.

  • Author_Institution
    Div. of Phys., Los Alamos Nat. Lab., NM, USA
  • Volume
    23
  • Issue
    1
  • fYear
    1995
  • fDate
    2/1/1995 12:00:00 AM
  • Firstpage
    89
  • Lastpage
    96
  • Abstract
    In capacitively coupled radio frequency discharges, the electrons gain and lose energy by reflection from oscillating, high voltage sheaths. When time-averaged, this results in stochastic heating, which at low pressure is responsible for most of the electron heating in these discharges. Previous derivations of stochastic heating rates have generally assumed that the electron distribution is a time-invariant, single-temperature Maxwellian, and that the sheath motion is slow compared to the average electron velocity, so that electrons gain or lose a small amount of energy in each sheath reflection. Here we solve for the stochastic heating rates in the opposite limit of fast sheath motion and consider the applicability of the slow and fast sheath equations in the intermediate region. We also consider the effect of a two-temperature Maxwellian distribution on particle balance and the effect of a time-varying temperature on the heating rates and densities
  • Keywords
    discharges (electric); high-frequency discharges; plasma density; plasma heating; plasma sheaths; plasma temperature; stochastic processes; average electron velocity; capacitive RF discharge; densities; electron distribution; electron reflection; fast sheath equations; heating rates; low pressure; nonMaxwellian distribution; oscillating high voltage sheaths; particle balance; slow sheath equations; stochastic electron heating; time-invariant single-temperature Maxwellian; time-varying distributions; time-varying temperature; Electrons; Heating; Plasma sheaths; Plasma temperature; Radio frequency; Reflection; Stochastic processes; Temperature distribution; US Department of Energy; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.376565
  • Filename
    376565