DocumentCode :
764350
Title :
Investigation on RF styrene plasma by emission spectroscopy
Author :
Chen, Meng ; Yang, Tsin-chi ; Ma, Zhenguo
Author_Institution :
Dept. of Electr. Eng., Tsinghua Univ., Beijing, China
Volume :
23
Issue :
2
fYear :
1995
fDate :
4/1/1995 12:00:00 AM
Firstpage :
151
Lastpage :
155
Abstract :
In order to gain an insight into the processes in an RF styrene plasma, gas phase plasmas were investigated by emission spectroscopy. The plasma reactor was a bell-jar-type chamber with two parallel plate electrodes. The measurement of plasma emission spectra was made with axial resolution. The correlations among the emission intensities of CH and C4H2+ species, the polymer deposition rate and the polymeric structure of the deposited films were studied. The proposed analysis showed that the gas flow pattern in the plasma reactor, and the difference in collisions between styrene monomer molecules and energetic free electrons occurring in the plasma region and RF sheath, made the fragments and ions produced change in the different regions, resulting in a change in polymeric structure and deposition rate of the polymer films. With increasing distance between the substrate position and the lower electrode, the deposition rate and the concentration of phenyl groups both at the polymer surface and in the bulk decreased
Keywords :
high-frequency discharges; plasma CVD; plasma collision processes; plasma diagnostics; plasma sheaths; polymer films; polymers; visible spectra; RF sheath; RF styrene plasma; bell-jar-type chamber; deposited films; emission spectra; emission spectroscopy; energetic free electrons; gas phase plasmas; phenyl groups; plasma emission spectra; plasma reactor; polymer deposition rate; polymer films; styrene monomer molecules; Electrodes; Electrons; Fluid flow; Inductors; Pattern analysis; Plasma measurements; Plasma sheaths; Polymer films; Radio frequency; Spectroscopy;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.376580
Filename :
376580
Link To Document :
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