DocumentCode :
764960
Title :
Magnetic Properties of Fe-Si-Ru Sputtered Films
Author :
Shiiki, K. ; Shiroishi, Y. ; Kumasaka, N. ; Aoki, S.
Author_Institution :
Central Research Lab., Hitachi Ltd., Tokyo
Volume :
1
Issue :
4
fYear :
1985
fDate :
7/1/1985 12:00:00 AM
Firstpage :
493
Lastpage :
494
Abstract :
The authors studied Fe-Si magnetic thin films with Ru added formed on glass substrates by RF sputtering. Addition of Ru tended to lower the saturation magnetic flux density, but the rate of decrease was smaller than for transition metals such as Cr. The permeability and coercive force remained unaffected. Polarization curve measurements and tests using salt sprays indicated that films with Ru added were more resistant to corrosion. Fe-Si-Ru alloys were obtained with a saturation flux density of about 1.7 T, a permeability of about 500 and a corrosive resistance comparable to that of Ni-Fe alloys.
Keywords :
Chromium; Coercive force; Glass; Magnetic films; Magnetic flux density; Magnetic properties; Permeability; Polarization; Radio frequency; Sputtering;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1985.4548835
Filename :
4548835
Link To Document :
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