Title :
Magnetic Properties of Fe-Si-Ru Sputtered Films
Author :
Shiiki, K. ; Shiroishi, Y. ; Kumasaka, N. ; Aoki, S.
Author_Institution :
Central Research Lab., Hitachi Ltd., Tokyo
fDate :
7/1/1985 12:00:00 AM
Abstract :
The authors studied Fe-Si magnetic thin films with Ru added formed on glass substrates by RF sputtering. Addition of Ru tended to lower the saturation magnetic flux density, but the rate of decrease was smaller than for transition metals such as Cr. The permeability and coercive force remained unaffected. Polarization curve measurements and tests using salt sprays indicated that films with Ru added were more resistant to corrosion. Fe-Si-Ru alloys were obtained with a saturation flux density of about 1.7 T, a permeability of about 500 and a corrosive resistance comparable to that of Ni-Fe alloys.
Keywords :
Chromium; Coercive force; Glass; Magnetic films; Magnetic flux density; Magnetic properties; Permeability; Polarization; Radio frequency; Sputtering;
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
DOI :
10.1109/TJMJ.1985.4548835