DocumentCode :
765302
Title :
Magnetic Properties of Nanocrystalline and Amorphous FeCoC Thin Films
Author :
Liu, Xiaoxi ; Miyao, Takuji ; Morisako, Akimitsu
Author_Institution :
Dept. of Inf. Eng., Shinshu Univ., Nagano
Volume :
42
Issue :
10
fYear :
2006
Firstpage :
2772
Lastpage :
2774
Abstract :
FeCoC thin films are prepared by reactive sputtering. Acetylene (C 2H2) gas is introduced to control the C composition in the films by adjusting the acetylene partial pressure (P acetylene/PAr). According to X-ray diffractometry and transmission electron microscopy results, the microstructure of the films changes from well crystalline to nanocrystalline and even to amorphous with the increase of acetylene partial pressure. Results show that the value of the saturation flux density (4piMs) decreases slowly from 24.5 to 23.5 kG with the increase of acetylene partial pressure (P2H2/PAr) from 0% to 1%. The 4pi Ms decreases dramatically with acetylene partial pressure higher than 1%. Coercivity in both the hard axis and easy axis directions shows minimums around the acetylene partial pressure of 1%. H ch and Hce as low as 1.3 Oe have been obtained at the same acetylene partial pressure. The above results can be explained by the measurement of internal stress and magnetostriction. All the films show compressive stress. However, the stress shows a minimum, about 0.2times10-9 dyne/cm2 with the acetylene partial pressure of 1%, and it increases dramatically for acetylene partial pressure higher than 1%
Keywords :
X-ray diffraction; amorphous magnetic materials; cobalt compounds; iron compounds; magnetic thin film devices; nanostructured materials; sputtering; stress measurement; transmission electron microscopy; FeCoC; X-ray diffractometry; acetylene gas; acetylene partial pressure; amorphous thin films; compressive stress; high-saturation magnetization; internal stress measurement; magnetostriction measurement; nanocrystalline thin films; reactive sputtering; saturation flux density; soft magnetic films; thin films magnetic properties; transmission electron microscopy; Amorphous materials; Argon; Compressive stress; Magnetic films; Magnetic properties; Microstructure; Pressure control; Sputtering; Transmission electron microscopy; X-ray diffraction; FeCo sputtered films; high-saturation magnetization; soft magnetic films;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2006.879891
Filename :
1704434
Link To Document :
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