DocumentCode :
765311
Title :
Ultrasoft and High Magnetic Moment NiFe Film Electrodeposited From a Cu ^2+ Contained Solution
Author :
Zong, B.Y. ; Han, G.C. ; Zheng, Y.K. ; Guo, Z.B. ; Li, K.B. ; Wang, L. ; Qiu, J.J. ; Liu, Z.Y. ; An, L.H. ; Luo, P. ; Li, H.L. ; Liu, B.
Author_Institution :
Data Storage Inst., Nat. Univ. of Singapore
Volume :
42
Issue :
10
fYear :
2006
Firstpage :
2775
Lastpage :
2777
Abstract :
We report a methodology to fabricate ultrasoft NiFe films via electrodeposition in a sulfate solution. With a little addition of Cu 2+ into the solution, NiFe films become extremely soft: typically, the film coercivities in the hard and easy axes are 0.03 and 0.15 Oe, respectively. The maximum relative permeability is also significantly increased to the order of 1times104. Meanwhile, these achieved ultrasoft NiFe films show a small but finite anisotropic field and high magnetic moments ranging from 1.1 to 1.65 T. These kinds of films can be potentially applied in current and future magnetic recording systems as well as biotechnological and microelectronic devices
Keywords :
electrodeposition; magnetic moments; magnetic thin films; nickel compounds; NiFe; biotechnological devices; electrodeposition; film coercivities; finite anisotropic field; high magnetic moment film; magnetic moments; magnetic recording systems; microelectronic devices; sulfate solution; ultrasoft film; Additives; Amorphous magnetic materials; Magnetic field measurement; Magnetic films; Magnetic moments; Magnetostriction; Saturation magnetization; Soft magnetic materials; Superconducting films; Thin film inductors; Cu; NiFe film; high magnetic moment; ultrasoft;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2006.880073
Filename :
1704435
Link To Document :
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