DocumentCode :
765455
Title :
Self-consistent particle-in-cell/Monte Carlo simulation of RF magnetron discharges of oxygen/argon mixture: effects of partial pressure ratio
Author :
Yonemura, Shigeru ; Nanbu, Kenichi
Author_Institution :
Inst. of Fluid Sci., Tohoku Univ., Sendai, Japan
Volume :
31
Issue :
4
fYear :
2003
Firstpage :
479
Lastpage :
487
Abstract :
The characteristics of RF planar magnetron discharges of O2/Ar mixture are clarified using the particle-in-cell/Monte Carlo method. The simulation is carried out for axisymmetrical magnetic fields. The spatial and temporal behavior of magnetron discharge is examined in detail. The O- ions are trapped in the plasma bulk by the time-averaged potential. The O- density is governed by a balance of generation and loss of O-. The positive ions Ar+, O2+, and O+ are distributed in such a way that the charge neutrality is kept in the plasma bulk. Since the peak point of O- density does not coincide with that of electron density, the spatial distributions of Ar+, O2+, and O+ have two peaks. The number densities of Ar+ and O- ions drastically increase when oxygen is added to the discharge gas Ar, and then saturated. In the case when the mole fraction of oxygen increases, the self-bias voltage on the target decreases. This phenomenon is investigated in detail and a clear physical explanation is presented.
Keywords :
Monte Carlo methods; high-frequency discharges; plasma density; plasma simulation; O2-Ar; O2/Ar mixture; RF magnetron discharges; axisymmetrical magnetic fields; charge neutrality; electron density; magnetron discharge; partial pressure ratio; physical explanation; plasma bulk; self-bias voltage; self-consistent particle-in-cell/Monte Carlo simulation; spatial behavior; spatial distributions; temporal behavior; time-averaged potential; Argon; Computational modeling; Electrons; Magnetic fields; Oxygen; Plasma density; Plasma simulation; Radio frequency; Saturation magnetization; Sputtering;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2003.815466
Filename :
1221816
Link To Document :
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