DocumentCode :
765480
Title :
Kirk effect in bipolar transistors with a nonuniform dopant profile in the collector
Author :
Elias, D. Cohen ; Ritter, D.
Author_Institution :
Dept. of Electr. Eng., Technion, Haifa, Israel
Volume :
27
Issue :
1
fYear :
2006
Firstpage :
25
Lastpage :
27
Abstract :
We have calculated the threshold current density of the Kirk effect in bipolar transistors with a nonuniform doping concentration in the collector. The threshold current is enhanced by more than 50% compared to the uniform doping case if the dopant profile is weighed toward the base and if velocity overshoot is small. Significant velocity overshoot restores the threshold value obtained with uniform doping.
Keywords :
current density; doping profiles; heterojunction bipolar transistors; semiconductor doping; Kirk effect; bipolar junction transistors; double heterojunction bipolar transistors; nonuniform dopant profiles; threshold current density; velocity overshoot; Bipolar transistors; Current density; Doping profiles; Double heterojunction bipolar transistors; Electrons; Heterojunction bipolar transistors; Kirk field collapse effect; Quasi-doping; Threshold current; Voltage; Bipolar junction transistors (BJTs); Kirk effect; double heterojunction bipolar transistor (DHBT); heterojunction bipolar transistor (HBT); quasi-doping;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2005.861401
Filename :
1561444
Link To Document :
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