Title :
Permalloy Patterning Effects on RF Inductors
Author :
Ni, Weiping ; Kim, Jinsook ; Kan, Edwin C.
Author_Institution :
Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY
Abstract :
Permalloy incorporated RF spiral inductors are fabricated on standard silicon substrates with a CMOS compatible process. Various patterns of permalloy thin films are designed to investigate the influences on the inductor performance with respect to different magnetization orientations, ferromagnetic resonance (FMR), induced eddy current, parasitic capacitance, and substrate loss
Keywords :
CMOS integrated circuits; Permalloy; capacitance; eddy currents; ferromagnetic resonance; magnetisation; silicon; thin film inductors; CMOS compatible process; RF spiral inductors; ferromagnetic resonance; induced eddy current; magnetization orientations; parasitic capacitance; permalloy patterning effects; permalloy thin films; substrate loss; CMOS process; Eddy currents; Magnetic resonance; Magnetization; Parasitic capacitance; Performance loss; Radio frequency; Silicon; Spirals; Thin film inductors; Eddy current; RF inductor; ferromagnetic resonance; substrate loss;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2006.879140
