DocumentCode
765505
Title
Permalloy Patterning Effects on RF Inductors
Author
Ni, Weiping ; Kim, Jinsook ; Kan, Edwin C.
Author_Institution
Sch. of Electr. & Comput. Eng., Cornell Univ., Ithaca, NY
Volume
42
Issue
10
fYear
2006
Firstpage
2827
Lastpage
2829
Abstract
Permalloy incorporated RF spiral inductors are fabricated on standard silicon substrates with a CMOS compatible process. Various patterns of permalloy thin films are designed to investigate the influences on the inductor performance with respect to different magnetization orientations, ferromagnetic resonance (FMR), induced eddy current, parasitic capacitance, and substrate loss
Keywords
CMOS integrated circuits; Permalloy; capacitance; eddy currents; ferromagnetic resonance; magnetisation; silicon; thin film inductors; CMOS compatible process; RF spiral inductors; ferromagnetic resonance; induced eddy current; magnetization orientations; parasitic capacitance; permalloy patterning effects; permalloy thin films; substrate loss; CMOS process; Eddy currents; Magnetic resonance; Magnetization; Parasitic capacitance; Performance loss; Radio frequency; Silicon; Spirals; Thin film inductors; Eddy current; RF inductor; ferromagnetic resonance; substrate loss;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2006.879140
Filename
1704452
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