DocumentCode :
765695
Title :
Fabrication of multiple wavelength lasers in GaAs-AlGaAs structures using a one-step spatially controlled quantum-well intermixing technique
Author :
Ooi, B.S. ; Ayling, S.G. ; Bryce, A.C. ; Marsh, J.H.
Author_Institution :
Dept. of Electron. & Electr. Eng., Glasgow Univ., UK
Volume :
7
Issue :
9
fYear :
1995
Firstpage :
944
Lastpage :
946
Abstract :
We have applied a new technique, based on impurity-free vacancy diffusion, to control the degree of intermixing across a wafer. Bandgap tuned lasers were fabricated using this technique. Five distinguishable lasing wavelengths were observed from five selected intermixed regions on a single chip. These lasers showed no significant change in transparency current, internal quantum efficiency or internal propagation loss, which indicates that the material quality was not degraded after intermixing.<>
Keywords :
III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium arsenide; optical fabrication; optical losses; quantum well lasers; transparency; GaAs-AlGaAs; GaAs-AlGaAs structures; bandgap tuned lasers; fabrication; impurity-free vacancy diffusion; intermixing degree control; internal propagation loss; internal quantum efficiency; lasing wavelengths; material quality; multiple wavelength lasers; one-step spatially controlled quantum-well intermixing technique; single chip; transparency current; wafer; Dielectric materials; Gallium arsenide; Laser tuning; Lithography; Optical device fabrication; Optical materials; Photonic band gap; Quantum well lasers; Thickness control; Waveguide lasers;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/68.414663
Filename :
414663
Link To Document :
بازگشت