Film Structures and Perpendicular Magnetic Anisotropy of RE-Fe Sputtered Films

The relation of film structure to magnetic anisotropy of GdFe films, sputtered with different bias voltages VB, are reported. Films were sputtered under an Ar pressure of 10 mTorr at various bias voltages VB. Film structures for different VB were determined using X-ray diffraction and SEM observations. Changes in film properties after annealing in air indicated that films formed with a high bias voltage are not easily oxidized. While structural changes occurred upon 300°C annealing of films formed with a low VB, no such changes were observed for films sputtered with a high VB.