Title :
Very-low-threshold index-confined planar microcavity lasers
Author :
Deppe, D.G. ; Huffaker, D.L. ; Shin, J. ; Deng, Q.
Author_Institution :
Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
Abstract :
A fabrication process for laterally index-confined planar microcavity lasers is given that results in continuous-wave thresholds as low as 59 μA for a properly tuned cavity (T=250 K). Characterization of the spontaneous emission mode shows that the lateral confinement, when reduced to the mode size expected for the planar cavity, appears to increase the spontaneous emission coupling to the lasing mode.
Keywords :
distributed Bragg reflector lasers; laser cavity resonators; laser modes; optical fabrication; quantum well lasers; spontaneous emission; 250 K; 59 muA; AlAs-GaAs; CaF-ZnSe; DBR; InGaAs; continuous-wave thresholds; fabrication process; lasing mode; lateral confinement; laterally index-confined planar microcavity lasers; mode size; planar cavity; properly tuned cavity; spontaneous emission coupling; spontaneous emission mode; very-low-threshold index-confined planar microcavity lasers; Current measurement; Laser modes; Laser tuning; Microcavities; Optical coupling; Optical microscopy; Oxidation; Propagation losses; Size measurement; Spontaneous emission;
Journal_Title :
Photonics Technology Letters, IEEE
