DocumentCode :
765874
Title :
Magnetization Relaxation in Sputtered Thin Fe Films: An FMR Study
Author :
Kuanr, Bijoy K. ; Kuanr, A.V. ; Camley, R.E. ; Celinski, Zbigniew
Author_Institution :
Dept. of Phys., Colorado Univ., Colorado Springs, CO
Volume :
42
Issue :
10
fYear :
2006
Firstpage :
2930
Lastpage :
2932
Abstract :
Recently, various groups have proposed competing relaxation mechanisms on the magnetization damping in thin magnetic films. We used the ferromagnetic resonance (FMR) technique to understand this behavior from FMR linewidths of sputtered thin Fe films sandwiched by normal metals (NM=Cu, Al, Ti, and Ta) of 30 Aring on each side. We made samples of Fe(d)/GaAs(100), Al/Fe(d)/Al/GaAs(100), Cu/Fe(d)/Cu/GaAs(100), Ti/Fe(d)/Ti/GaAs(100), and Ta/Fe(d)/Ta/GaAs(100), with d=20 to 300 Aring. Delta H scales with d-2 in bare Fe/GaAs and Al/Fe(d)/Al series of samples following the well-known two-magnon mechanism. The sandwich Fe series with Cu, Ti, and Ta follow d-1 behavior attributed to recently proposed spin pumping process. After analyzing the data, we conclude Ti/Ta as good spin sink materials, with a mixing conductance twice/thrice larger than Cu. We termed Cu as poor spin sink material in the sandwich Fe structures. Our analysis shows that FMR linewidth data is a powerful tool to investigate interfacial transport properties of magnetic sandwich structures
Keywords :
damping; ferromagnetic resonance; magnetic relaxation; magnetic thin films; ferromagnetic resonance; interfacial transport; magnetic sandwich structures; magnetic thin films; magnetization damping; magnetization relaxation; spin pumping; spin sink materials; Conducting materials; Damping; Data analysis; Gallium arsenide; Iron; Magnetic analysis; Magnetic films; Magnetic materials; Magnetic resonance; Magnetization; Damping; magnetic films; microwave measurements; thin films;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2006.878408
Filename :
1704486
Link To Document :
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