DocumentCode
766170
Title
Critical Angle Behavior of Exchange Bias and Coercivity in CoFe/MnIr Bilayers
Author
Kim, Dong Young ; Kim, CheolGi ; Kim, Chong-Oh ; Naka, M. ; Tsunoda, M. ; Takahashi, M.
Author_Institution
Res. Center for Adv. Magnetic Mater., Chungnam Nat. Univ.
Volume
42
Issue
10
fYear
2006
Firstpage
3011
Lastpage
3013
Abstract
Angular dependence of Hex and Hc, and the critical angle behavior are measured in CoFe/MnIr bilayers annealed at 200degC and 340degC. The interfacial exchange coupling anisotropy and the antiferromagnet anisotropy at tAF<tc AF are estimated from the best fitting of angular dependence of Hex and Hc using Stoner-Wohlfarth (S-W) model. These results confirm existence of interfacial exchange coupling anisotropy between F and AF layers for tAF<tc AF. The measured critical angles for tAF>tc AF as well as for tAF <tc AF are well explained using S-W model
Keywords
antiferromagnetic materials; cobalt alloys; coercive force; iridium alloys; iron alloys; magnetic anisotropy; manganese alloys; 200 C; 340 C; CoFe-MnIr; S-W model; Stoner-Wohlfarth model; angular dependence; antiferromagnet anisotropy; coercivity; critical AF thickness; critical angle behavior; exchange bias; interfacial exchange coupling anisotropy; Anisotropic magnetoresistance; Annealing; Antiferromagnetic materials; Coercive force; Couplings; Goniometers; Magnetic field measurement; Magnetic materials; Magnetization; X-ray diffraction; Critical AF thickness; Stoner–Wohlfarth model; critical angle; exchange bias and coercivity;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2006.879756
Filename
1704513
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