DocumentCode :
766516
Title :
Near single-crystal electrical properties of polycrystalline HgI2 produced by physical vapor deposition
Author :
Zuck, A. ; Schieber, M. ; Khakhan, O. ; Burshte, Z.
Author_Institution :
Sch. of Appl. Sci. & Technol., Hebrew Univ. of Jerusalem, Israel
Volume :
50
Issue :
4
fYear :
2003
Firstpage :
991
Lastpage :
997
Abstract :
Polycrystalline films of HgI2 prepared by physical vapor deposition (PVD) were found to have electrical charge transport properties similar to those of single crystals. Transient charge transport (TCT) measurements were used to evaluate the electrical conduction properties of the samples. The mobility μ, trapping time τ, and surface recombination velocity s of electrons or holes were determined by analyses of transient voltages developed across the sample in response to a drift of the corresponding charge carriers created by alpha particle absorption near one of the electrodes. Typical electron and hole mobilities were μn=88 cm2/V·s and μp=4.1 cm2/V·s, respectively; trapping times were τn>16 μs and τp<3.5 μs, and surface recombination velocities sn≅1.4×105 cm/s and sp≅3.7×103 cm/s. All parameters depend to a large extent on the material deposition technology. The effect of carriers being first generated in near-surface traps and then gradually released is observed.
Keywords :
alpha-particle detection; carrier mobility; crystal structure; drift chambers; electrical conductivity; mercury compounds; surface recombination; vapour deposition; 16 mus; 3.5 mus; HgI2; PVD; alpha particle absorption; deposition technology; electrical charge transport properties; electrical conduction properties; hole mobilities; near-surface traps; physical vapor deposition; polycrystalline films; single-crystal electrical properties; surface recombination velocities; Atherosclerosis; Charge carrier processes; Charge measurement; Chemical vapor deposition; Crystals; Current measurement; Electric variables measurement; Electron mobility; Electron traps; Transient analysis;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2003.814544
Filename :
1221909
Link To Document :
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