DocumentCode
766704
Title
Studies of the reverse read method and second-bit effect of 2-bit/cell nitride-trapping device by quasi-two-dimensional model
Author
Lue, Hang-Ting ; Hsu, Tzu-Hsuan ; Wu, Min-Ta ; Hsieh, Kuang-Yeu ; Liu, Rich ; Lu, Chih-Yuan
Author_Institution
Emerging Central Lab., Macronix Int. Co., Hsinchu, Taiwan
Volume
53
Issue
1
fYear
2006
Firstpage
119
Lastpage
125
Abstract
The reverse read method and second-bit effect of the 2-bit/cell nitride-trapping device are comprehensively studied by a quasi-two-dimensional (2-D) model. Based on this model, analytical equations are derived to simulate the surface potential of the device with locally injected electrons. This model indicates that the reverse read method exploits the local drain-induced barrier lowering (DIBL) effect that reduces the potential barrier produced by the locally injected electrons. The experimental results of the two-region behavior of second-bit effect can be well explained and simulated by this analytical model. Two-dimensional numerical calculations are also carried out to verify these analytical equations. The impact of short-channel effect on the second-bit effect is also examined.
Keywords
electron traps; read-only storage; semiconductor device models; surface potential; 2-bit/cell nitride-trapping device; local drain-induced barrier lowering effect; locally injected electrons; quasi 2D model; reverse read method; second-bit effect; short-channel effect; surface potential; Analytical models; Channel hot electron injection; Equations; Equivalent circuits; Flash memory; Nonvolatile memory; Numerical simulation; Silicon; Two dimensional displays; Voltage; 2-bit/cell; NROM; local drain-induced barrier lowering (DIBL); reverse read method; second-bit effect; short channel effect;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2005.860644
Filename
1561556
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