• DocumentCode
    766940
  • Title

    Preparation Conditions and Characteristics of Sputtered Co-Cr Films

  • Author

    Niimura, Y. ; Nakagawa, S. ; Naoe, M.

  • Author_Institution
    Tokyo Inst. of Tech., Fac. of Engng.
  • Volume
    1
  • Issue
    8
  • fYear
    1985
  • Firstpage
    951
  • Lastpage
    953
  • Abstract
    The two facing targets sputtering technique was used to fabricate thin films in an attempt to avoid the disadvantages of the dependence of the c-axis orientation on film thickness in developing films for perpendicular recording media with good perpendicular magnetic properties. It was found that when film formation conditions are optimum, even when film thickness is less than 1000 Å, the Co-Cr sputtered film is formed wvith ¿¿50 less than 3°.
  • Keywords
    Anisotropic magnetoresistance; Magnetic fields; Magnetic films; Magnetic properties; Magnetics Society; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Plasmas; Sputtering; Substrates;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1985.4549025
  • Filename
    4549025
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=766940