Microstructure and Its Growth Mechanism in Sputtered Co-Cr Films

The two facing targets sputtering technique is used to fabricate Co-Cr films in order to investigate the relations between the microstructure and Cr segregation and the variation in magnetic properties by analyzing the growth mechanism. It was found that the samples formed under high PAr had Hc¿ and Hcu values 30-50 percent higher than films formed in the medium PAr range (0.4-10 mTorr). This seems to be due to the fact that the individual columnar particles forming these films are magnetically isolated and independent.