DocumentCode :
767142
Title :
Effect of Annealing on Extraordinary Hall Effects in Sputtered Granular Cu 
Co 
Thin Films
Co Thin FilmsAuthor :
Wang, Jian-Qing ; Kim, Nam H.
Author_Institution :
Dept. of Phys., Binghamton Univ.
Volume :
42
Issue :
10
fYear :
2006
Firstpage :
3282
Lastpage :
3284
Abstract :
This work explores the nanostructure dependence of extraordinary Hall effect (EHE) in Cu80Co20 granular thin films. Upon annealing, an unusual nanostructure evolution in Cu-Co into two Co particles-size distribution affects the magnetotransport properties, most evidently in the EHE. It was concluded that the EHE in annealed films primarily depends on the population of smaller sized particles. Upon annealing, the EHE field sensitivity was gradually reduced from 0.78 nOmega-cm/Oe for the as-deposited film to 0.04 nOmega-cm/Oe for 400degC annealed one
Keywords :
Hall effect; cobalt alloys; copper alloys; discontinuous metallic thin films; magnetic annealing; nanostructured materials; 400 C; Cu80Co20; EHE; annealed granular films; extraordinary Hall effects; field sensitivity; granular thin films; magnetic annealing; magnetotransport properties; nanostructure dependence; particle-size dependence; Annealing; Conductivity; Hall effect; Magnetic field measurement; Magnetic films; Magnetic properties; Magnetic separation; Sputtering; Temperature; Transistors; Annealed granular films; extraordinary Hall effect (EHE); field sensitivity; particle-size dependence;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2006.879744
Filename :
1704600
Link To Document :
