• DocumentCode
    768005
  • Title

    AlInGaAs/AlGaAs strained quantum-well ridge waveguide lasers grown by metalorganic chemical vapor deposition

  • Author

    Hughes, N.A. ; Connolly, J.C. ; Gilbert, D.B. ; Murphy, K.B.

  • Author_Institution
    David Sarnoff Res. Center, Princeton, NJ, USA
  • Volume
    4
  • Issue
    2
  • fYear
    1992
  • Firstpage
    113
  • Lastpage
    115
  • Abstract
    AlInGaAs/AlGaAs strained quantum-well ridge waveguide diode lasers with an emission wavelength of 890 nm are presented. These devices exhibit both single spatial and longitudinal mode operation up to 30 mW of optical output power. A CW threshold current of 13 mA was obtained for a 5- mu m-wide ridge waveguide having a cavity length of 500 mu m. The differential quantum efficiency was 52%. The lateral and perpendicular far-field radiation patterns (FWHM) from the laser were 6 degrees and 51 degrees , respectively. Reliability testing on uncoated gain-guided lasers made from the same wafer showed no sudden death failures and degradation rates as low as 4.6%/kh.<>
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; laser modes; optical waveguides; semiconductor growth; semiconductor junction lasers; vapour phase epitaxial growth; 13 mA; 30 mW; 5 micron; 500 micron; 52 percent; 890 nm; AlInGaAs-AlGaAs; CW threshold current; IR; cavity length; degradation rates; differential quantum efficiency; diode lasers; emission wavelength; far-field radiation patterns; longitudinal mode operation; metalorganic chemical vapor deposition; optical output power; reliability testing; ridge waveguide lasers; semiconductors; single spatial mode lasing; strained quantum-well; sudden death failures; uncoated gain-guided lasers; Diode lasers; Laser modes; Optical devices; Optical waveguides; Power generation; Quantum well lasers; Stimulated emission; Testing; Threshold current; Waveguide lasers;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.122331
  • Filename
    122331