DocumentCode :
768468
Title :
Fe/Cu Multilayered Thin Films by RF-Magnetron Sputtering Method
Author :
Kozono, Y. ; Komuro, M. ; Narishige, S. ; Hanazono, M.
Author_Institution :
Hitachi Research Laboratory, Hitachi Ltd.
Volume :
2
Issue :
2
fYear :
1987
Firstpage :
183
Lastpage :
184
Abstract :
This paper reports on research into the relationship between structure and magnetic properties of Fe/Cu multilayered films grown by the sputtering method in which the Fe and Cu in the system did not have a tendency to form solid solutions with respect to one another. Auger electron spectroscopy analysis and transmission electron microscopy observation showed that these films were periodic multilayered structures. As the thickness of a single layer decreased, the coercivity decreased, and single-axis anistropy in the plane was observed clearly.
Keywords :
Coercive force; Iron; Magnetic analysis; Magnetic films; Magnetic materials; Magnetic properties; Saturation magnetization; Sputtering; Transmission electron microscopy; X-ray diffraction;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1987.4549370
Filename :
4549370
Link To Document :
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