DocumentCode :
768729
Title :
Magnetic Properties of Fe-Al-Si Sputtered Films
Author :
Takahashi, M. ; Narita, T. ; Suwabe, S. ; Tanaka, T. ; Wakiyama, T.
Author_Institution :
Tohoku Univ. Faculty of Engng, Sendai.
Volume :
2
Issue :
3
fYear :
1987
fDate :
3/1/1987 12:00:00 AM
Firstpage :
246
Lastpage :
248
Abstract :
Whereas Fe-Al-Si film of composition 5.5 percent Al-9.5 percent Si-remainder Fe (Sendust composition range) has a high permeability and good soft magnetic properties, the sensitivity of the latter to composition changes presents difficulties as regards film formation. The authors studied another promising composition range, 2.5 percent Al-5.5 percent Si-remainder Fe, sputtering films in this range on quartz substrates. Films obtained had smaller coercivities than Sendust films, near-zero magnetostriction, similar to Sendust, and a large in-plane uniaxial anisotropy. This composition borders on a disordered and an ordered phase, suggesting that film properties may be influenced greatly by annealing and other treatment.
Keywords :
Anisotropic magnetoresistance; Annealing; Coercive force; Iron; Magnetic films; Magnetic properties; Magnetostriction; Permeability; Sputtering; Substrates;
fLanguage :
English
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
Publisher :
ieee
ISSN :
0882-4959
Type :
jour
DOI :
10.1109/TJMJ.1987.4549392
Filename :
4549392
Link To Document :
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