• DocumentCode
    768791
  • Title

    Latchup in CMOS from single particles

  • Author

    Johnston, A.H. ; Hughlock, B.W.

  • Author_Institution
    Boeing Aerosp. & Electron., Seattle, WA, USA
  • Volume
    37
  • Issue
    6
  • fYear
    1990
  • fDate
    12/1/1990 12:00:00 AM
  • Firstpage
    1886
  • Lastpage
    1893
  • Abstract
    Single-particle latchup in bulk CMOS was examined using heavy ions, a californium fission source, and a pulsed laser. Experiments with the laser demonstrated that latchup triggering was caused by secondary photocurrent in either the vertical or lateral parasitic transistor. Charge diffusion is shown to be important for bipolar transistor responses in latchup, which in turn makes it important to have uniform charge deposition for depths of 10 μm or more. Californium sources have insufficient range, which causes cross sections measured with californium to be much lower than cross sections from heavy ion experiments
  • Keywords
    CMOS integrated circuits; integrated circuit testing; ion beam effects; laser beam effects; Cf fission source; SEU; bipolar transistor responses; bulk CMOS; charge collection; charge diffusion; cross sections; heavy ions; latchup triggering; lateral parasitic transistor; linear energy transfer; pulsed laser; secondary photocurrent; uniform charge deposition; vertical parasitic transistor; Aerospace electronics; Bipolar transistors; CMOS process; CMOS technology; Circuits; Optical pulses; Photoconductivity; Pulsed laser deposition; Single event upset; Testing;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.101205
  • Filename
    101205