DocumentCode :
768791
Title :
Latchup in CMOS from single particles
Author :
Johnston, A.H. ; Hughlock, B.W.
Author_Institution :
Boeing Aerosp. & Electron., Seattle, WA, USA
Volume :
37
Issue :
6
fYear :
1990
fDate :
12/1/1990 12:00:00 AM
Firstpage :
1886
Lastpage :
1893
Abstract :
Single-particle latchup in bulk CMOS was examined using heavy ions, a californium fission source, and a pulsed laser. Experiments with the laser demonstrated that latchup triggering was caused by secondary photocurrent in either the vertical or lateral parasitic transistor. Charge diffusion is shown to be important for bipolar transistor responses in latchup, which in turn makes it important to have uniform charge deposition for depths of 10 μm or more. Californium sources have insufficient range, which causes cross sections measured with californium to be much lower than cross sections from heavy ion experiments
Keywords :
CMOS integrated circuits; integrated circuit testing; ion beam effects; laser beam effects; Cf fission source; SEU; bipolar transistor responses; bulk CMOS; charge collection; charge diffusion; cross sections; heavy ions; latchup triggering; lateral parasitic transistor; linear energy transfer; pulsed laser; secondary photocurrent; uniform charge deposition; vertical parasitic transistor; Aerospace electronics; Bipolar transistors; CMOS process; CMOS technology; Circuits; Optical pulses; Photoconductivity; Pulsed laser deposition; Single event upset; Testing;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.101205
Filename :
101205
Link To Document :
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