DocumentCode
768791
Title
Latchup in CMOS from single particles
Author
Johnston, A.H. ; Hughlock, B.W.
Author_Institution
Boeing Aerosp. & Electron., Seattle, WA, USA
Volume
37
Issue
6
fYear
1990
fDate
12/1/1990 12:00:00 AM
Firstpage
1886
Lastpage
1893
Abstract
Single-particle latchup in bulk CMOS was examined using heavy ions, a californium fission source, and a pulsed laser. Experiments with the laser demonstrated that latchup triggering was caused by secondary photocurrent in either the vertical or lateral parasitic transistor. Charge diffusion is shown to be important for bipolar transistor responses in latchup, which in turn makes it important to have uniform charge deposition for depths of 10 μm or more. Californium sources have insufficient range, which causes cross sections measured with californium to be much lower than cross sections from heavy ion experiments
Keywords
CMOS integrated circuits; integrated circuit testing; ion beam effects; laser beam effects; Cf fission source; SEU; bipolar transistor responses; bulk CMOS; charge collection; charge diffusion; cross sections; heavy ions; latchup triggering; lateral parasitic transistor; linear energy transfer; pulsed laser; secondary photocurrent; uniform charge deposition; vertical parasitic transistor; Aerospace electronics; Bipolar transistors; CMOS process; CMOS technology; Circuits; Optical pulses; Photoconductivity; Pulsed laser deposition; Single event upset; Testing;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.101205
Filename
101205
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