Title :
Magnetic Characteristics of Fine Permalloy Patterns
Author :
Yonekura, Y. ; Yanase, T. ; Majima, T.
Author_Institution :
Fujitsu Laboratories, Ltd., Atsugi.
fDate :
3/1/1987 12:00:00 AM
Abstract :
The magnetization behavior of patterned Permalloy film used in bubble memory elements is described. A total of 4.6 à 106 pattern elements were formed in Permalloy film evaporated onto a GGG substrate, spaced at a period of 4.5 ¿m. In-plane magnetization curves showed almost no change when a bias field was applied normal to the film, and patterning resulted in a strong shape effect. The in-plane magnetization curves had bends which were attributed to different magnetization characteristics prevailing in different portions of each pattern.
Keywords :
Anisotropic magnetoresistance; Helium; Magnetic field measurement; Magnetic fields; Magnetic films; Magnetic hysteresis; Magnetic susceptibility; Magnetization; Shape; Substrates;
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
DOI :
10.1109/TJMJ.1987.4549408