Amorphous Cores Produced by High Rate Sputtering

In attempts to obtain new amorphous materials for use in magnetic cores, high-rate magnetron sputtering was used to grow Co-Zr-Mo-Ni amorphous films on glass substrates, which were annealed at temperatures above the Curie point Tc but below the crystallization temperature Tx. Although the annealing was effective in reducing the anisotropy, it did not totally eliminate it. Ring cores with excellent frequency characteristics were also obtained.