Title :
Semiconductor lithography for the next millennium
fDate :
4/1/1996 12:00:00 AM
Abstract :
Volume production of ICs sporting 0.1-micrometer structures is being predicted for 2007. Manufacturing tools now being developed will feature much shorter wavelengths and elaborate mirrors in place of traditional lenses. Also being honed is proximity X-ray lithography, which has produced a first level of a memory circuit with 0.25-micrometer dimensions
Keywords :
X-ray lithography; integrated circuit manufacture; proximity effect (lithography); 0.1-micrometer structures; IC production; manufacturing tools; memory circuit; mirrors; proximity X-ray lithography; semiconductor lithography; volume production; Circuits; Lenses; Mirrors; Production; Semiconductor device manufacture; X-ray lithography;
Journal_Title :
Spectrum, IEEE
