Near-field quasi-null control with far-field sidelobe level maintenance in line source distributions

An improving method, based on the Taylor line source, that allocates a quasi-null in a specified angular position of near-field pattern, and simultaneously controls the general topography of the far-field sidelobe level without significant loss of directivity, compared with optimal efficiency Taylor distribution, of the latter, is presented. The method is based on the application of the simulated annealing technique, by achieving the complex roots of the pattern distribution. An example is developed that demonstrates this accomplishment